Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsGerard Van Schothorst, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
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Abstract
A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.
Claims11
A lithographic apparatus, comprising:
- a substrate holder configured to hold a substrate;
- a radiation system configured to condition a beam of radiation;
- a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation;
- a projection system that projects the patterned beam onto a target portion of the substrate;
- a base frame;
- at least one actuator that moves the substrate holder relative to the base frame;
- and
- a balance mass, supported by the base frame, arranged such that the substrate holder exerts a reaction force on the balance mass,
- wherein the balance mass is resiliently connected to the base frame with a suspension frequency that is different than resonant frequency of the base frame.
A lithographic apparatus, comprising:
- a substrate holder configured to hold a substrate;
- a radiation system configured to condition a beam of radiation;
- a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation;
- a projection system that projects the patterned beam onto a target portion of the substrate;
- a base frame;
- at least one actuator configured to apply a force to the base frame;
- a balance mass supported by the base frame and coupled to the base frame via the at least one actuator;
- and
- a controller configured to control the at least one actuator,
- wherein when one or more moving components within the apparatus applies a reaction force to the base frame, the controller controls the actuator to apply a force, which is opposite in magnitude and direction to the reaction force, to the base frame.
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material, the substrate being carried by a substrate holder that is movable, via at least one actuator relative to a base frame;
- projecting a patterned beam of radiation onto a target portion of the substrate;
- and
- moving the substrate holder that exerts a reaction force to a balance mass that is supported by and coupled to the base frame;
- wherein the balance mass is resiliently coupled to the base frame with a suspension frequency that is different than resonant frequency of the base frame.
Dependencies are inferred from the claim text.