Sensor shield

A lithographic apparatus comprising:

• a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c);
• a liquid supply system configured to supply a liquid to a space between the substrate and the projection system;
• and
• a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid, the shield comprising a gas inlet provided in a vicinity of the portion of the measurement system and configured to generate a gas jet to remove substantially all liquid on or near the portion of the measurement system.

A lithographic apparatus comprising:

• a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c);
• a liquid supply system configured to supply a liquid to a space between the substrate and the projection system;
• and
• a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid, the shield comprising a vacuum outlet provided in a vicinity of the portion of the measurement system and configured to draw away substantially all liquid on or near the portion of the measurement system.