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US 7,248,332 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorCassandra May Owen
Life of this patent
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Abstract
A lithographic apparatus is provided with a charged object on a projection system of the lithographic apparatus, a substrate table of the lithographic apparatus, or both that is configured to have an electric charge to attract particles thereto.
Claims18
A lithographic apparatus comprising:
- an illuminator arranged to provide a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device configured to impart the beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system arranged to project the patterned beam onto a target portion of the substrate;
- and
- a charged object on the substrate table configured to have an electric charge to attract particles thereto and configured as a ring to surround a substrate when placed on the substrate table.
3 more elements
A device manufacturing method comprising:
- projecting a patterned beam of radiation, using a projection system of a lithographic apparatus, onto a target portion of a substrate held on a substrate table of a lithographic apparatus;
- and
- using an electric charge on the substrate table to attract particles thereto, the electric charge, configured as a ring, surrounding the substrate.
Dependencies are inferred from the claim text.