Contamination barrier with expandable lamellas
AssigneeASML Netherlands B.V.
InventorsLevinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box
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Abstract
A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.
Claims21
A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source, said contamination barrier comprising:
- an inner ring;
- an outer ring;
- and
- a plurality of lamellas extending in a radial direction from a main axis, each of said lamellas being positioned in a respective plane that comprises said main axis,
- wherein at least one outer end of each of said lamellas is slidably connected to at least one of said inner and outer ring.
A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source, said contamination barrier comprising:
- a plurality of lamellas;
- and
- a support structure that slidably engages said lamellas,
- wherein said lamellas and said support structure are configured and arranged to allow said lamellas to expand and contract in response to changes in temperature.
A contamination barrier that permits radiation to pass therethrough and captures debris from a radiation source generated by the radiation source, said contamination barrier including a support structure and a plurality of thin plate members mounted on said support structure, said radiation propagating along an optical axis and said thin plate members being disposed along a plane that includes said axis, said plate members being slidably movable relative to said support structure.
A radiation system comprising:
- a contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source;
- and
- a collector that collects radiation passing said contamination barrier,
- wherein said contamination barrier comprises an inner ring, an outer ring, and a plurality of lamellas extending in a radial direction from a main axis, each of said lamellas being positioned in a respective plane that comprises said main axis, and at least one outer end of each of said lamellas is slidably connected to at least one of said inner and outer ring.
A lithographic projection apparatus comprising:
- a radiation system to provide a beam of radiation;
- a support structure to support a patterning structure to be irradiated by a beam of radiation to pattern said beam of radiation;
- a substrate support to support a substrate;
- and
- a projection system to image an irradiated portion of the patterning structure onto a target portion of the substrate,
- wherein said radiation system comprises a contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source, said contamination barrier comprising an inner ring, an outer ring, and a plurality of lamellas extending in a radial direction from a main axis, each of said lamellas being positioned in a respective plane that comprises said main axis, and at least one outer end of each of said lamellas is slidably connected to at least one of said inner and outer ring;
- and a collector for collecting radiation passing said contamination barrier.
A method of manufacturing an integrated structure by a lithographic process, said method comprising:
- radiating a beam of radiation through a radiation system;
- providing a support structure to support a patterning structure to be irradiated by the beam of radiation to pattern said beam of radiation;
- providing a substrate support to support a substrate;
- and
- providing a projection system to image an irradiated portion of the patterning structure onto a target portion of the substrate,
- wherein said radiating the beam of radiation through the radiation system comprises passing radiation from a radiation source through a contamination barrier comprising an inner ring, an outer ring, and a plurality of lamellas extending in a radial direction from a main axis, wherein each of said lamellas being positioned in a respective plane that comprises said main axis, and at least one outer end of each of said lamellas is slidably connected to at least one of said inner and outer ring;
- and collecting radiation passing said contamination barrier.
A method of manufacturing an integrated structure by a lithographic process, said method comprising:
- generating a beam of radiation with a radiation source;
- capturing debris from the radiation source;
- collecting radiation passing said contamination barrier;
- patterning said beam of radiation with a patterning structure;
- and
- imaging an irradiated portion of the patterning structure onto a target portion of a substrate,
- wherein said capturing debris comprises providing a support structure and a plurality of lamellas that are slidably engaged with the support structure so as to allow the plurality of lamellas to expand and contract in response to changes in temperature.
Dependencies are inferred from the claim text.