System and apparatus for control of sputter deposition process

A method of suppressing arcing on a target during a magnetron sputter deposition process, the method comprising:

• applying pulsed DC power to the target from a pulsed DC power system;
• applying RF electrical power to the target from an RF power system;
• monitoring the electrical power at the target to detect an electrical arc on a surface of the target;
• shutting down the pulsed DC power supply when an electrical arc is detected on the surface of the target;
• monitoring the DC voltage at the target by a DC bias detection circuit to detect when the pulsed DC voltage to the target falls below a predefined threshold voltage;
• and
• when the DC bias detection circuit detects the reduction in power to the target, sending a signal to the RF power supply to shut down.

A method of suppressing arcing on a target during a magnetron sputter deposition process, the method comprising:

• applying pulsed DC voltage to the target from a pulsed DC power system;
• applying RF electrical power to the target from an RF power supply;
• providing feedback to the RF power system from the pulsed DC power system;
• monitoring the electrical voltage at the target to detect an electrical arc on a surface of the target;
• shutting down the pulsed DC power supply when an electrical arc is detected on the surface of the target;
• and
• sending a signal to the RF power system from the pulsed DC power system when the pulsed DC power supply has been shut down to shut down the RF power supply.

An apparatus for suppressing arcs on a target in a vacuum sputter deposition system, the apparatus comprising:

• a pulsed DC power system comprising at least:
• a pulsed DC power supply;
• a filter unit;
• and
• a sensor;
• an RF power system comprising at least:
• an RF power supply;
• a tuner;
• and
• a DC bias detection circuit;
• a target that is electrically connected to the pulsed DC power system and the RF power system;
• the sensor in the pulsed DC power system monitoring a surface of the target to detect an electrical arc, sending a signal to the pulsed DC power supply to shut down when an electrical arc is detected on the surface of the target;
• and
• a DC bias detection circuit for detecting when the pulsed DC power to the target falls below a predefined threshold and sending a signal to the RF power supply to shut down.

An apparatus for suppressing arcs on a target in a vacuum sputter deposition system, the apparatus comprising:

• a pulsed DC power system comprising at least:
• a pulsed DC power supply;
• a filter unit;
• and
• a sensor;
• an RF power system comprising at least:
• an RF power supply;
• an RF control;
• and
• a match network;
• a target that is electrically connected to the pulsed DC power system and the RF power system;
• the sensor in the pulsed DC power system monitoring a surface of the target to detect an electrical arc on a surface of the target and sending a signal to the pulsed DC power supply to shut down when an electrical arc is detected on the surface of the target;
• and
• a feedback control mechanism capable of detecting a shut down of the pulsed DC power supply and sending a signal to the RF power supply to shut down.