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US 7,126,766 B2Granted
Optical stop apparatus and exposure apparatus having the same
AssigneeCanon Kabushiki Kaisha
InventorHiroyuki Tomita
Life of this patent
Estimating the term…
Abstract
An optical stop unit includes plural light blocking plates, and a cam mechanism for driving the plural light blocking plates to vary an aperture diameter, the cam mechanism including a cam follower and a cam groove, wherein the cam follower and cam groove have mutually facing surfaces, through which the cam follower and cam groove contact each other, and at least one of which surfaces has a curved section that is substantially perpendicular to a plane formed by the plural light blocking plates.
Claims7
An optical stop unit comprising:
- plural light blocking plates;
- and a cam mechanism for driving said plural light blocking plates to vary an aperture diameter, said cam mechanism including a cam follower and a cam groove that movably accommodates the cam follower, wherein at least one of the cam follower and cam groove has a cylindrical section that projects towards the other, wherein at least one of the cam follower and the cam groove is notched so that the one has a convex section against the other.
An optical stop unit comprising:
- plural light blocking plates;
- and a cam mechanism for driving said plural light blocking plates to vary an aperture diameter, said cam mechanism including a cam follower and a cam groove that movably accommodates the cam follower, wherein at least one of the cam follower and cam groove has a cylindrical section that projects towards the other, wherein the cam groove and cam follower contact each other at one point.
An exposure apparatus comprising:
- an illumination optical system for illuminating a reticle or mask using light from a light source;
- and a projection optical system for projecting a pattern formed on the reticle or mask onto an object to be exposed, wherein said illumination optical system includes an optical stop unit and illuminates the reticle or mask via the optical stop unit and/or said projection optical system includes the optical stop unit and projects the pattern onto the object via the optical stop unit, and wherein the optical stop unit includes plural light blocking plates, and a cam mechanism for driving said plural light blocking plates to vary an aperture diameter, said cam mechanism including a cam follower and a cam groove that movably accommodates the cam follower, wherein at least one of the cam follower and cam groove has a cylindrical section that projects towards the other, wherein at least one of the cam follower and the cam groove is notched so that the one has a convex section against the other.
A device fabrication method comprising the steps of:
- providing an exposure apparatus that includes an illumination optical system for illuminating a reticle or mask using light from a light source;
- and a projection optical system for projecting a pattern formed on the reticle or mask onto an object to be exposed, the illumination optical system includes an optical stop unit and illuminates the reticle or mask via the optical stop unit and/or said projection optical system includes the optical stop unit and projects the pattern onto the object via the optical stop unit, the optical stop unit includes plural light blocking plates, and a cam mechanism for driving said plural light blocking plates to vary an aperture diameter, the cam mechanism including a cam follower and a cam groove that movably accommodates the cam follower, at least one of the cam follower and cam groove has a cylindrical section that projects towards the other, at least one of the cam follower and the cam groove is notched so that the one has a convex section against the other;
- exposing an object to be exposed using said exposure apparatus;
- and processing the exposed object.
1 more element
Dependencies are inferred from the claim text.