Illumination apparatus, exposure apparatus using the same, and device fabricating method
AssigneeCanon Kabushiki Kaisha
InventorKen-ichiro Mori
Life of this patent
Estimating the term…
Abstract
An illumination apparatus includes a first light integrator including a first optical element that has a section vertical to an optical axis and defined by a plurality of first sides, the first light integrator uniformly illuminating an illuminated plane, and a second light integrator for uniformly illuminating the first light integrator so that an outline of an illumination range in which light incident upon the first light integrator illuminates the light incidence plane of the first light integrator includes a plurality of second sides each of which is not parallel with any one of the first sides.
Claims14
An illumination optical system comprising:
- a first optical system for illuminating a plurality of condensing systems of a third light integrator with light from a light source;
- and
- a second optical system for illuminating an illuminated plane with light from the plurality of condensing systems of the third light integrator,
- wherein said first optical system includes a first light integrator having a plurality of condensing systems and a first condenser lens that forms a Fourier transformation relationship between a light exit plane of the first light integrator and a light incidence plane of the third light integrator;
- and
- wherein said second optical system includes a second light integrator having a plurality of condensing systems and a second condenser lens that forms a Fourier transformation relationship between a light exit plane of the third light integrator and a light incidence plane of the second light integrator, and
- wherein each side on an outline of a light incidence plane of each condensing system of the third light integrator is not parallel to any one of sides that form an outline of a light incidence plane of condensing systems of the first light integrator, and
- wherein each side on the outline of the light incidence plane of each condensing system of the third light integrator is not parallel to any one of sides that form an outline of a light incidence plane of each condensing system of the second light integrator.
An exposure apparatus comprising:
- an illumination optical system illuminating a reticle or a mask with light from a light source, said illumination optical system comprising a first optical system for illuminating a plurality of condensing systems of a third light integrator with light from a light source;
- and a second optical system for illuminating the reticle or the mask with light from the plurality of condensing systems of the third light integrator, wherein said first optical system includes a first light integrator having a plurality of condensing systems and a first condenser lens that forms a Fourier transformation relationship between a light exit plane of the first light integrator and a light incidence plane of the third light integrator;
- and wherein said second optical system includes a second light integrator having a plurality of condensing system and a second condenser lens that forms a Fourier transformation relationship between a light exit plane of the third light integrator and a light incidence plane of the second light integrator, and wherein each side on an outline of a light incidence plane of each condensing system of the third light integrator is not parallel to any one of the sides that form an outline of a light incidence plane of condensing systems of the first light integrator, and wherein each side of the outline of the light incidence plane of each condensing system of the third light integrator is not parallel to any one of the sides that form an outline of a light incidence plane of each condensing system of the second light integrator;
- and
- a projection optical system for projecting an image of a pattern of the reticle or the mask onto an exposed plate.
Dependencies are inferred from the claim text.