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US 7,126,674 B2Granted
Positioning device and device manufacturing method
AssigneeASML Netherlands B.V.
InventorHans Butler
Life of this patent
Estimating the term…
Abstract
A positioning device for positioning an object that includes a first actuator and a connector arranged between the first actuator and the object. The connector includes a resilient member and a second actuator connected in series with the resilient member. The first actuator being constructed and arranged to exert a force in a first direction on the connector and the second actuator is controlled to maintain a distance between the first actuator and the object in the first direction substantially constant.
Claims3
A lithographic apparatus, comprising:
- a radiation system configured to condition a beam of radiation;
- a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation;
- a substrate holder configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a positioning device configured to position the support structure or the substrate holder, the positioning device comprising:
- a first actuator;
- and
- a connector comprising a resilient member and a second actuator connected in series with the resilient member, the connector arranged between the first actuator and the support structure or the substrate holder,
- wherein the first actuator is configured to exert a force on the connector along a first direction and the second actuator is configured to control a dimension of its body along the first direction based on information regarding a dimension of the resilient member along the first direction.
7 more elements
A lithographic apparatus, comprising:
- a radiation system configured to condition a beam of radiation;
- a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation;
- a substrate holder configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a positioning device configured to position the radiation system or the projection system, the positioning device comprising:
- a first actuator;
- and
- a connector comprising a resilient member and a second actuator connected in series with the resilient member, the connector arranged between the first actuator and the radiation system or the projection system,
- wherein the first actuator is configured to exert a force on the connector along a first direction and the second actuator is configured to control a dimension of its body along the first direction based on information regarding a dimension of the resilient member along the first direction.
7 more elements
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- conditioning a beam of radiation using a radiation system;
- configuring the beam of radiation with a desired pattern in its cross-section based on a patterning device;
- positioning the substrate or the patterning device via a positioning device, the positioning device comprising:
- a first actuator;
- and
- a connector comprising a resilient member and a second actuator connected in series with the resilient member, the connector arranged between the first actuator and the substrate or the patterning device,
- wherein the first actuator is configured to exert a force on the connector along a first direction and the second actuator is controlled to maintain a distance between the first actuator and the substrate or the patterning device in the first direction substantially constant;
- and
- projecting the patterned beam of radiation onto a target portion of the substrate.
7 more elements
Dependencies are inferred from the claim text.