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AssigneesFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., Philips Corporate Intellectual Property GmbH, Koninklijke Philips Electronics N.V.
InventorsJürgen Klein, Willi Neff, Stefan Seiwart, Klaus Bergmann, Joseph Pankert, Michael Löken
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A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography, wherein a discharge chamber (10) of a predetermined gas pressure and two electrodes (11, 12) are used, wherein the electrodes have an opening (14, 15), respectively, positioned on the same symmetry axis (13) and, in the course of a voltage increase (16) upon reaching a predetermined ignition voltage (Uz), generate a plasma (17) located in the area between their openings (14, 15), which plasma is a source of the radiation (17′) to be generated, wherein an ignition of the plasma (17) is realized by affecting the gas pressure and/or by triggering, and wherein, with the ignition of the plasma (17), an energy storage device supplies by means of the electrodes (11, 12) stored energy into the plasma (17), characterized in that the ignition of the plasma (17) is realized by using a predetermined ignition delay (18).
A device for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, the device comprising:
Dependencies are inferred from the claim text.