Workpiece holder for vacuum processing
AssigneeEclipse Energy Systems, Inc.
InventorRaymond Thomas Westfall
Life of this patent
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AssigneeEclipse Energy Systems, Inc.
InventorRaymond Thomas Westfall
Estimating the term…
A substrate for use in a vacuum chamber has a workpiece supporting surface that has two or more mutually electrically insulated bifilar conductors configured as interleaved spirals disposed on it. Each of these bifilar conductors has a respective electrode at each of its two ends. This provides an electrostatic chuck for clamping a workpiece to the supporting surface when an electric voltage is applied between the two bifilar conductors or between one of the two bifilar conductors and an insulating workpiece. This arrangement also provides for electric heating of the workpiece when an electric voltage is applied between the two electrodes associated with one of the bifilar conductors. Moreover, when the electrical resistance of at least one of the bifilar conductors is known as a function of temperature, this arrangement allows one to sense the temperature of a workpiece supported on the substrate.
An electrostatic chuck for clamping a workpiece to a supporting surface of the chuck, the chuck comprising:
An electric heating apparatus for heating a workpiece to a selected temperature when the workpiece abuts a workpiece supporting surface of a substrate, the heating apparatus comprising:
Apparatus for supporting a workpiece, the apparatus comprising:
Dependencies are inferred from the claim text.