Immersion lithographic process using a conforming immersion medium
AssigneeAdvanced Micro Devices, Inc.
InventorsChristopher F. Lyons, Carl P. Babcock, Jongwook Kye
Life of this patent
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Abstract
A method of making a device using a lithographic system having a lens from which an exposure pattern is emitted. A conforming immersion medium can be positioned between a photo resist layer and the lens. The photo resist layer, which can be disposed over a wafer, and the lens can be brought into intimate contact with the conforming immersion medium. The photo resist can then be exposed with the exposure pattern so that the exposure pattern traverses the conforming immersion medium.
Claims21
A method of making a device using a lithographic system having a lens from which an exposure pattern is emitted, comprising:
- providing a wafer and a photo resist layer disposed over the wafer;
- positioning a conforming immersion medium between the photo resist layer and the lens;
- moving at least one of the wafer and the lens such that the lens and the photo resist are in intimate contact with the conforming immersion medium;
- and
- exposing the photo resist with the exposure pattern, the exposure pattern traversing the conforming immersion medium.
A method of making a device using a lithographic system having a lens from which an exposure pattern is emitted, comprising:
- providing a wafer and a photo resist layer disposed over the wafer;
- bringing each of the lens and the photo resist layer into intimate contact with a conforming immersion medium, the conforming immersion medium disposed between the lens and the photo resist layer;
- and
- exposing the photo resist with the exposure pattern, the exposure pattern traversing the conforming immersion medium.
Dependencies are inferred from the claim text.