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US 7,125,639 B2Granted
Molecular transfer lithography
AssigneeThe Board of Trustees of the Leland Stanford Junior University
InventorCharles Daniel Schaper
Life of this patent
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Abstract
A method for the fabrication of patterned devices, in which a latent image is initially formed in a photosensitive material on a carrier, and the exposed material containing the latent image is physically transferred to a substrate before processing. Physical transfer is enhanced by the appropriate selection of coating surface properties and additional coating layers, and by processing steps, such as heating and UV exposure, to promote adhesion to the substrate and detachment from the carrier.
Claims24
A process for patterning a substrate comprising the steps of:
- coating a carrier with a photosensitive material,
- exposing the photosensitive material to a pattern of radiation, and
- physically transferring the exposed material to the substrate.
Dependencies are inferred from the claim text.