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US 7,125,583 B2Granted
Chemical vapor deposition chamber pre-deposition treatment for improved carbon doped oxide thickness uniformity and throughput
AssigneeIntel Corporation
InventorsEbrahim Andideh, Kevin L. Peterson, Jeff Bielefeld
Life of this patent
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Abstract
A method for improving thickness uniformity and throughput of a carbon doped oxide deposition process is described. That method comprises removing pre-deposition steps in a deposition phase. Moreover, helium plasma is added to a pre-clean phase to eliminate the production of dummy wafers.
Claims9
A method comprising:
- applying a helium plasma treatment to a CVD chamber that includes a chamber wall and a spindle;
- cleaning the chamber walls with a first cleaning plasma after the helium plasma application;
- cleaning the spindle with a second cleaning plasma after the helium plasma application;
- and
- depositing a carbon doped oxide (CDO) film in the CVD chamber.
2 more elements
A method comprising:
- preparing a chemical vapor deposition (CVD) chamber for carbon doped oxide deposition by treating the chamber with a helium plasma for greater than one minute;
- cleaning a chamber wall of the CVD chamber with a first cleaning plasma after the helium plasma application;
- cleaning a spindle of the CVD chamber with a second cleaning plasma after the helium plasma application;
- and
- setting a gas pressure in the CVD chamber.
2 more elements
A method comprising:
- setting a first gas flow of a chemical vapor deposition chamber, wherein the chamber comprises a plurality of walls and a spindle;
- treating the chamber with helium plasma for approximately two minutes;
- cleaning the plurality of chamber walls with a first cleaning plasma after the helium plasma treatment;
- cleaning the spindle with a second cleaning plasma after the helium plasma treatment;
- purging the chamber;
- setting a second gas flow of the chemical vapor deposition chamber;
- and
- depositing a carbon doped oxide for approximately 65 seconds.
5 more elements
Dependencies are inferred from the claim text.