Device for determining the mask version utilized for each metal layer of an integrated circuit
AssigneeSTMicroelectronics S.r.l.
InventorArnaud Deleule
Life of this patent
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AssigneeSTMicroelectronics S.r.l.
InventorArnaud Deleule
Estimating the term…
A device for determining the version of metal mask utilized for producing a given metal layer (Metal3) in an integrated circuit including a plurality of metal layers (Metal0, . . . , Metal3), and any modification made to the given metal layer (Metal3) requiring generation of a new version of the corresponding metal mask. The device includes a cell (Cell) integrated into the metal layer (Metal3) including at least a first voltage source (Vdd) for supplying a first voltage level, at least a second voltage source (GND) for supplying a second voltage level, and an output bus composed of at least one conductor wire (S1, S2) connected selectively to one of the first and second voltage sources as a function of the version of metal mask used to produce the metal layer, so as to generate a binary output signal representative of the mask version utilized.
A device for determining a version of metal mask utilized for producing a given metal layer in an integrated circuit comprising a plurality of metal layers, wherein any modification made to the given metal layer requires generation of a new version of a corresponding metal mask, the device comprising:
An integrated circuit comprising a plurality of metal layers, wherein each metal layer comprises:
Dependencies are inferred from the claim text.