Lithographic apparatus and device manufacturing method

A device manufacturing method comprising:

• conditioning a beam of radiation;
• supporting a patterning device with an article support, said patterning device configured to pattern the beam of radiation, said article support comprising a plurality of supporting protrusions;
• projecting said patterned beam of radiation onto a substrate;
• releasing said patterning device from said article support with a releasing device;
• and
• protecting at least a boundary portion of said plurality of supporting protrusions during said release of said patterning device.

A device manufacturing method comprising:

• conditioning a beam of radiation;
• patterning the beam of radiation with a patterning device;
• supporting a substrate with an article support, said article support comprising a plurality of supporting protrusions;
• projecting said patterned beam of radiation onto a target portion of said substrate;
• releasing said substrate from said article support with a releasing device;
• and
• protecting at least a boundary portion of said plurality of supporting protrusions during said release of said substrate.

An article support for supporting a substantially flat article to be placed in a lithographic apparatus, said article support comprising:

• a plurality of supporting protrusions for supporting the article;
• a boundary substantially surrounding said supporting protrusions;
• and
• at least one protective member located near said boundary for protecting at least a boundary portion of said supporting protrusions during release of said article.