Lithographic apparatus and device manufacturing method

A method of manufacturing a device, comprising:

• projecting a beam of radiation onto a target portion of a substrate with a projection system;
• imparting a pattern to a cross-section of the beam of radiation to form a patterned beam using a patterning device;
• and
• supporting at least one of the substrate and the patterning device in a flexible manner by using a chuck system, the chuck system including a chuck to hold one of the substrate and the patterning device and a frame movable relative to the projection system to hold the chuck, and providing flexible support in at least one degree of freedom between the chuck and the frame and resisting deformation in a plane parallel to a direction in which said frame is movable.

A chuck system constructed to support an object in a lithographic apparatus, said chuck system comprising:

• a chuck constructed to hold the object;
• a frame constructed to hold said chuck, said frame being configured to be movable within the lithographic apparatus;
• and
• a chuck support structure operable between said chuck and said frame and constructed to support said chuck relative to said frame,
• said chuck support structure including a flexure element, said flexure element being coupled between said chuck and said frame, and said flexure element being flexible in at least one degree of freedom and resistant to deformation in a plane parallel to a direction in which said frame is movable.