Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorArno Jan Bleeker
Life of this patent
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Abstract
In an immersion lithography apparatus, an isolator is provided between the substrate table and the projection system to, for example, prevent currents in the liquid exerting forces on the projection system that might tend to distort the reference frame to which said projection system is connected. The isolator may be maintained still relative to the reference frame by an actuator system responsive to a position sensor mounted on the reference frame. At least a portion of the isolator may have the same refractive index as the liquid.
Claims19
A lithographic projection apparatus, comprising:
- a support structure for supporting patterning means, the patterning means configured to pattern the projection beam according to a desired pattern;
- a substrate table for holding a substrate;
- a projection system for projecting the patterned beam onto a target portion of the substrate;
- an isolator having at least a portion to allow passage of the beam therethrough, provided between the projection system and the substrate table and mechanically isolated from the projection system to limit or prevent transmittance of vibration or forces through a liquid to the projection system;
- and
- a liquid confinement system for holding a liquid in a space between the isolator and the substrate table.
A device manufacturing method, comprising:
- holding a liquid in a space between an isolator disposed between a substrate table and a projection system, the isolator mechanically isolated from the projection system to limit or prevent transmittance of vibrations or forces through the liquid to the projection system;
- and
- projecting a patterned beam of radiation through the liquid onto a target portion of a substrate on the substrate table.
A lithographic projection apparatus, comprising:
- a substrate table configured to hold a substrate;
- a projection system configured to project a patterned beam onto a target portion of the substrate;
- an isolator having at least a portion to allow passage of the beam therethrough, provided between the projection system and the substrate table and mechanically isolated from the projection system to limit or prevent transmittance of vibration or forces through the liquid to the projection system;
- and
- a liquid confinement system configured to hold a liquid in a space between the isolator and the substrate table.
Dependencies are inferred from the claim text.