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AssigneeMicron Technology, Inc.
InventorsCraig M. Carpenter, Ross S. Dando, Dan Gealy, Garo J. Derderian, Allen P. Mardian
Estimating the term…
CVD, ALD, and other vapor processes used in processing semiconductor workpieces often require volatilizing a liquid or solid precursor. Certain embodiments of the invention provide improved and/or more consistent volatilization rates by moving a reaction vessel. In one exemplary embodiment, a reaction vessel is rotated about a rotation axis which is disposed at an angle with respect to vertical. This deposits a quantity of the reaction precursor on an interior surface of the vessel's sidewall which is exposed to the headspace as the vessel rotates. Other embodiments employ drivers adapted to move the reaction vessel in other manners, such as a pendulum arm to oscillate the vessel along an arcuate path or a mechanical linkage which moves the vessel along an elliptical path.
A method of processing a micro-device workpiece in a reaction chamber, comprising:
A method of volatilizing a volatilizable reaction precursor having a volatility in a vessel having an interior and a central rotation axis at an angle with respect to vertical, comprising:
Dependencies are inferred from the claim text.