Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorCheng-Qun Gui
Life of this patent
Estimating the term…
Abstract
A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.
Claims7
A programmable patterning device, comprising:
- a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element;
- and
- a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector in the array of reflectors being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions.
A lithographic apparatus, comprising:
- an illumination system that supplies a beam of radiation;
- a patterning array including individually controllable elements that selectively divide the beam of radiation into a plurality of sub-beams modulated according to a desired pattern of the patterning array;
- and
- a substrate table that supports a substrate, such that the substrate is positioned to receive the plurality of sub-beams,
- wherein the patterning array is a programmable patterning device comprising,
- a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element, and
- a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions.
A device manufacturing method, comprising:
- using a patterning device to selectively divide a beam of radiation into a plurality of sub-beams modulated according to a desired pattern on the patterning device, the pattering device including,
- a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element, and
- a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector in the array of reflectors being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions;
- and
- positioning a substrate to receive the plurality of sub-beams.
Dependencies are inferred from the claim text.