Exposure device, exposure method and device manufacturing method
AssigneeNikon Corporation
InventorsToshihiko Tsuji, Takaaki Kimura, Yoshitomo Nagahashi
Life of this patent
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Abstract
An exposure device, where circulating systems and for controlling a temperature varied by the driving of a linear motor are connected to a reticle stage and wafer stage, a controller sets the temperature of refrigerant circulating through the circulating system by driving heater, circulating system is connected to a projection optical system and a controller sets the temperature of refrigerant circulating through a circulating system by driving heater by a feedforward control to control the temperature of the refrigerant circulating through the circulating system.
Claims40
An exposure device which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- a movable device which is provided with a drive source and which performs a predetermined operation using the drive source;
- and
- a temperature control system which controls a temperature of the movable device using feedforward control, wherein
- the temperature control system controls the temperature of the movable device by circulating a temperature controlled fluid to the movable device, and comprises a detecting section which detects the temperature of the fluid, and
- the temperature control system controls the temperature of the movable device by also performing feedback control based on detection results from the detecting section.
An exposure device which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- an object of control in which temperature variations are generated;
- a temperature control system which controls the temperature of the object of control by circulating a fluid to the object of control;
- an input device which inputs as a parameter at least one of information relating to pipes through which the fluid is circulated, information relating to a flow velocity of the fluid, and information relating to a flow rate of the fluid;
- and
- a setting device that sets control characteristics of the temperature control system based on the parameter information that is input by the input device,
- wherein the control characteristics include a control constant which relates to a control response when the temperature control system controls the temperature of the fluid, or information relating to a timing at which the temperature control system controls the temperature of the fluid.
An exposure device comprising:
- an exposure main body section which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage;
- and
- a temperature control system which controls a temperature of an object of control, in which temperature variations are generated, by circulating a fluid to the object of control,
- wherein the temperature control system comprises:
- a first setting device which sets the temperature of the fluid within a predetermined temperature range;
- a second setting device which sets the temperature of the fluid that is temperature controlled by the first setting device within a temperature range that is smaller than the predetermined temperature range;
- and
- a control device which controls an operation of at least the second setting device, and
- the second setting device and the control device are located away from the first setting device, and also closer to the vicinity of the object of control than the first setting device.
An exposure method which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- an input step of inputting as a parameter at least one of information relating to pipes through which the fluid is circulated to an object of control, information relating to a flow velocity of the fluid, and information relating to a flow rate of the fluid;
- and
- a setting step, based on the parameter information that is input in the input step, of setting control characteristics of a temperature control system that controls the temperature of the object of control by circulating the fluid to the object of control,
- wherein the control characteristics include a control constant that relates to a control response when the temperature control system controls the temperature of the fluid, or information relating to a timing at which the temperature control system controls the temperature of the fluid.
An exposure device which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- an object of control in which temperature variations are generated;
- a temperature control system which controls the temperature of the object of control by circulating a fluid to the object of control;
- an input device which inputs as a parameter information relating to an exposure procedure for exposing a pattern on the reticle onto the substrate;
- and
- a setting device which sets control characteristics of the temperature control system based on the parameter information that is input by the input device.
An exposure device which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- a driving source which drives a movable device;
- a temperature control system which controls the temperature of the driving source by circulating a fluid to the driving source;
- a measuring device which measures a period from when the driving source stops a driving of the movable device until the driving source next restarts a driving of the movable device;
- and
- a setting device which sets control characteristics of the temperature control system based on the measurement results from the measuring device.
An exposure device which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- a driving source which drives a movable device;
- a temperature control system which controls the temperature of the driving source using a feedforward control method or a control method other than the feedforward control method by circulating a fluid to the driving source;
- a measuring device which measures a period from when the driving source stops a driving of the movable device until the driving source next restarts a driving of the movable device;
- and
- a determining device which, based on measurement results from the measuring device, determines whether to execute the feedforward control method in the temperature control system or whether to execute a control method other than the feedforward control method in the temperature control system.
An exposure method which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- an input step of inputting as a parameter information relating to an exposure procedure for exposing a pattern on the reticle onto the substrate;
- and
- a setting step, based on the parameter that is input in the input step, of setting control characteristics of a temperature control system that controls the temperature of an object of control, in which temperature variations are generated, by circulating fluid to the object of control.
An exposure method which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- a measuring step of measuring a period from when a driving source that drives a movable device stops a driving of the movable device until the driving source next restarts a driving of the movable device;
- and
- a setting step, based on measurement results from the measuring step, of setting control characteristics of a temperature control system that controls the temperature of the driving source by circulating fluid to the drive source.
An exposure method which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- a measuring step of measuring a period from when a driving source that drives a movable device stops a driving of the movable device until the driving source next restarts a driving of the movable device;
- and
- a determining step, based on measurement results from the measuring step, of determining which control method will be executed by a temperature control system that controls the temperature of the driving source using a feedforward control method or a control method other than a feedforward control method by circulating fluid to the driving source.
An exposure method which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- performing feedforward control of a temperature of a movable device by circulating a temperature controlled fluid to the movable device;
- detecting a temperature of the fluid;
- and
- controlling the temperature of the movable device by also performing feedback control based on detection results of the temperature of the fluid.
An exposure device which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- a movable device which is provided with a drive source and which performs a predetermined operation using the drive source;
- and
- a temperature control system which controls a temperature of the movable device using feedforward control, wherein
- the temperature control system controls the temperature of the movable device by circulating a temperature controlled fluid to the movable device, and performs feedforward control to the temperature of the fluid.
An exposure method which projects via a projection optical system an image of a pattern formed on a reticle that is held on a reticle stage onto a substrate that is held on a substrate stage, comprising:
- controlling a temperature of a movable device by circulating a temperature controlled fluid to the movable device;
- and
- performing feedforward control of a temperature of the fluid.
Dependencies are inferred from the claim text.