Method of closing an antifuse using laser energy
AssigneeInternational Business Machines Corporation
InventorsWilliam T. Motsiff, William R. Tonti, Richard Q. Williams
Life of this patent
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Abstract
A structure and method for providing an antifuse which is closed by laser energy with an electrostatic assist. Two or more metal segments are formed over a semiconductor structure with an air gap or a porous dielectric between the metal segments. Pulsed laser energy is applied to one or more of the metal segments while a voltage potential is applied between the metal segments to create an electrostatic field. The pulsed laser energy softens the metal segment, and the electrostatic field causes the metal segments to move into contact with each other. The electrostatic field reduces the amount of laser energy which must be applied to the semiconductor structure to close the antifuse.
Claims5
A method of closing an antifuse comprising the steps of:
- (a) providing an antifuse structure having at least two metal segments with a fuse gap between the metal segments, wherein the fuse gap is filled with a dielectric material selected from the group consisting of polyimide and porous silicate;
- and
- (b) simultaneously applying pulsed laser energy to the metal segments and applying a voltage potential between the metal segments.
Dependencies are inferred from the claim text.