Preparation of photomasks
AssigneeUniversity Court of the University of Dundee
InventorsAlexander Grant Fitzgerald, Katrin Jones
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Abstract
The present invention relates to the preparation of an x-ray photomask by exposing a free-standing film of a radiation sensitive metal/chalcogenide to an electron beam scanned in a defined pattern so as to generate areas in the film of reduced metal content in accordance with the defined pattern, as well as novel x-ray photomasks.
Claims9
A method of preparing an x-ray photomask for use in the production of semi-conductor devices, the method comprising the steps of:
- a) providing a free-standing film of a radiation sensitive metal/chalcogenide;
- and
- b) exposing the film to an electron beam scanned in a defined pattern, in order that metal in the metal/chalcogenide diffuses away on exposure to the electron beam so as to generate areas in the film of reduced metal content in accordance with the defined pattern.
A photomask comprising an x-ray transmissive substrate comprising a radiation sensitive metal doped chalcogenide, supporting a metal film comprising areas of metal which areas are x-ray non-transmissive and areas of reduced metal content, or substantially metal-free which areas are x-ray transmissive.
Dependencies are inferred from the claim text.