Method and device for checking lithography data
AssigneeMicron Technology, Inc.
InventorsHusayn Alvarez-Gomariz, John R. C. Futrell
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Abstract
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made. In one example, a portion of a region such as a semiconductor lithography pattern is subtracted from consideration in identifying potential optical interactions. In one example, a ring-like region remains and is analyzed.
Claims32
A method of checking data in a two dimensional pattern, comprising:
- identification of a region within the pattern that surrounds at least one feature in the pattern;
- subtraction of the feature from within the region, leaving a two dimensional ring-like region;
- and
- analyzing optical behavior within the ring-like region to predict optical interactions.
A method of forming a reticle, comprising:
- organizing data into a two dimensional pattern of features;
- checking the data, including:
- identification of a region within the pattern that surrounds at least one feature in the pattern;
- subtraction of the feature from within the region, leaving a two dimensional ring-like region;
- analyzing optical behavior within the ring-like region to identify interaction regions;
- organizing data into at least one modifying feature located within at least one interaction region;
- and
- printing the two dimensional pattern of features and the at least one modifying feature onto a reticle substrate.
A method of forming a pattern of features on a semiconductor substrate:
- organizing data into a two dimensional pattern of features;
- checking the data, including:
- identification of a region within the pattern that surrounds at least one feature in the pattern;
- subtraction of the feature from within the region, leaving a two dimensional ring-like region;
- analyzing optical behavior within the ring-like region to identify interaction regions;
- organizing data into at least one modifying feature located within at least one interaction region;
- printing the two dimensional pattern of features and the at least one modifying feature onto a reticle substrate;
- and
- forming the two dimensional pattern of features on the semiconductor substrate wherein the modifying feature substantially prevents printing of unwanted features.
A machine-readable medium with instructions stored thereon, the instructions when executed operable to cause:
- identification of a region within the pattern that surrounds at least one feature in the pattern;
- subtraction of the feature from within the region, leaving a two dimensional ring-like region;
- and
- analyzing of optical behavior within the ring-like region to predict optical interactions.
A pattern generating system, comprising:
- a processor;
- a memory, containing instructions thereon, the instructions when executed operable to cause:
- identification of a region within the pattern that surrounds at least one feature in the pattern;
- subtraction of the feature from within the region, leaving a two dimensional ring-like region;
- and
- analyzing of optical behavior within the ring-like region to predict optical interactions.
Dependencies are inferred from the claim text.