Semiconductor device, electronic circuit array substrate provided with the same and method of manufacturing the electronic circuit array substrate
AssigneeToshiba Matsushita Display Technology Co., Ltd.
InventorTetsuya Kawamura
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Abstract
Dummy holes 36 are made for every one of display dot 5a, 5b and 5c at pixels 5 through interlayer film 33 up to gate electrode and scanning lines 11 before interlayer film 33 on glass substrate 3 is washed. When interlayer film 33 is washed, electric charges stored at semiconductor layer 21 are substantially the same in quantity as those stored at gate electrode and scanning lines 11 through dummy holes 36. Thus, electric potentials at gate electrode and scanning lines 11 are substantially equal in magnitude to those at semiconductor layer 21. This can suppress the occurrence of voltage differences imposed between gate electrode and scanning lines 11 and semiconductor layer 21.
Claims10
An electronic circuit array substrate, comprising:
- a display region provided with display dots;
- a semiconductor device including
- a semiconductor layer provided in said display region,
- an insulation film provided on said semiconductor layer,
- electrically conductive lines formed on said insulation film, and
- an interlayer film formed on said lines and provided with a first aperture connected to said semiconductor layer and a second aperture connected to said electrically conductive lines;
- and
- an optically transparent substrate on which said semiconductor device is formed, wherein
- said semiconductor layer, said insulation film and said electrically conductive lines form thin-film transistors, and
- said thin-film transistors are provided for said display dots and said second aperture is provided for said display dots of said display region.
A method of manufacturing an electronic circuit array substrate, comprising:
- forming a semiconductor layer in a display region on an optically transparent substrate;
- forming an insulation film on said semiconductor layer;
- forming electrically conductive lines on said insulation film;
- forming an interlayer film on said electrically conductive lines, wherein said semiconductor layer, said conductive lines and said insulation film form thin-film transistors provided for display dots in said display region;
- making a first aperture through said interlayer film and said insulation film up to said semiconductor layer;
- making a second aperture through said interlayer film up to said conductive lines, said second aperture is provided for said display dots;
- and
- washing said interlayer film after said second aperture is made.
Dependencies are inferred from the claim text.