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US 7,094,523 B1Granted
Developer solution and process for use
OwnerKesheng Feng, Daniel J. Hartinventors
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Abstract
An improved composition and method for the development of resists is disclosed. The method comprises contacting the resist with a developer solution comprising a source of alkalinity and a cationic surfactant which is an ethoxylated and/or propoxylated tallow amine. The improved developer solution more effectively removes the uncured resist from the resist coated surface.
Claims12
An aqueous developer composition comprising:
- a. a source of alkalinity;
- and
- b. a cationic surfactant of the following structure:
- where:
- R1=fatty acid group;
- R2═—H, —CH2CH2O—, or —CH2CH(CH3)O—R2═—H;
- R3═—H, —CH2CH2O—, or —CH2 CH(CH3)O—;
- R4═—H if x2 is zero, alkyl, aryl, or alkaryl;
- sum of all x1=an integer totaling from 3 to 30;
- sum of all x2=an integer totaling 0 to 15.
7 more elements
A method of developing a resist coated surface said method comprising:
- contacting the resist coated surface comprising areas of cured resist and areas of uncured resist with a developer composition comprising:
- a. a source of alkalinity;
- and
- b. a cationic surfactant of the following structure.
- where:
- R1=fatty acid group;
- R2═—H, —CH2CH2O—, or —CH2 CH(CH3)O—R2═—H;
- R3═—H, —CH2CH2O—, or —CH2 CH(CH3)O—;
- R4═—H if x2 is zero, alkyl, aryl, or alkaryl;
- sum of all x1=an integer totaling from 3 to 30;
- sum of all x2=an integer totaling 0 to 15.
8 more elements
Dependencies are inferred from the claim text.