Photomask assembly and method for protecting the same from contaminants generated during a lithography process

A photomask assembly, comprising:

• a pellicle assembly including a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame, the pellicle frame including an inner wall and an outer wall;
• a vent aperture formed in the pellicle frame between the inner and outer walls, the vent aperture operable to allow a gas to pass therethrough;
• a photomask coupled to a second surface of the pellicle frame opposite the pellicle film;
• a protected space defined by an area between the pellicle film, the photomask and the inner and outer walls of the pellicle frame;
• and
• a molecular sieve associated with the vent aperture, the molecular sieve operable to prevent airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the protected space.

A method for protecting a photomask from contaminants generated during a lithography process, comprising:

• providing a photomask assembly including a pellicle assembly coupled to a photomask, the pellicle assembly comprising:
• a pellicle film coupled to a first surface of a pellicle frame including an inner wall and an outer wall;
• and
• a second surface of the pellicle frame coupled to the photomask opposite the pellicle film;
• and
• associating a molecular sieve with the pellicle assembly, the molecular sieve operable to prevent airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask.