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US 7,078,852 B2Granted
Method and apparatus for simultaneously depositing and observing materials on a target
AssigneeCoincident Beams Licensing Corporation
InventorMichael Mauck
Life of this patent
Estimating the term…
Abstract
A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
Claims17
A method for focusing an electron beam and an ion beam, simultaneously, with the same lens at the same time comprising:
- (a) directing a first beam along a first axis into a field where said first beam exits said field along a second axis;
- and
- (b) directing a second beam along a third axis into said field where said second beam exits said field along a fourth axis, said third axis is at least one of colinear and coaxial with said second axis and said second beam along said third axis has a different direction of travel than said first beam along said second axis, wherein each of said first beam and said second beam is one of an electron beam and an ion beam.
An apparatus that focuses an electron beam and an ion beam, simultaneously, with the same lens at the same time comprising:
- (a) a field;
- (b) a first beam directed along a first axis into said field;
- (c) a second beam directed along a second axis into said field;
- and
- (d) whereby said first and second beams are focused, by interaction between said field and said first and second beams, into a third beam directed along a third axis, wherein each of said first beam and said second beam is one of an electron beam and an ion beam.
2 more elements
Dependencies are inferred from the claim text.