Ceramic substrate, ceramic heater, electrostatic chuck and wafer prober for use in semiconductor producing and inspecting devices

Abstract

A ceramic substrate for semiconductor manufacture and/or inspection which is conducive to decrease in α-rays radiated to prevent electrical errors, and to decrease an electrostatic chucking force such as heater or wafer prober, generation of particles, and circuit defects. The ceramic substrate is configured such that the level of α-rays radiated from the surface of the ceramic substrate is not higher than 0.250 c/cm2.hr.

Dependencies are inferred from the claim text.