Apparatus for applying disparate etching solutions to interior and exterior surfaces
AssigneeQuantum Global Technologies, LLC
InventorDavid S. Zuck
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AssigneeQuantum Global Technologies, LLC
InventorDavid S. Zuck
Estimating the term…
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently contaminated interior and exterior surfaces by using those articles to separate a cleaning vessel into separate chambers, one chamber for the interior surface and one for the exterior surface. Different chemistries are then applied to the differently contaminated surfaces. This embodiment reduces the required volume of etchant, and consequently saves the cost, treatment, and disposal of toxic chemicals. One embodiment further reduces the requisite etchant volume using one or more volume-displacement elements that displace some of the etchant volume.
A cleaning system comprising:
A cleaning system comprising:
A cleaning system comprising:
Dependencies are inferred from the claim text.