Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus

A method of simulating substrate patterns, comprising:

• preparing reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• preparing exposure data positioning said reticle patterns on said substrate for exposure;
• and
• executing an AND logic operation of patterns corresponding to neighboring regions exposed on said substrate through said reticle patterns to simulate patterns of regions exposed on said substrate more than once.

A method of simulating substrate patterns, comprising:

• preparing reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• preparing exposure data positioning said reticle patterns on said substrate for exposure;
• making an inference pattern corresponding to a substrate pattern on the assumption that said substrate pattern is formed based on said reticle and exposure data;
• and
• executing a logic operation of said inference pattern and patterns corresponding to a substrate pattern formed in accordance with said reticle and exposure data.

A method of simulating substrate patterns, comprising:

• preparing reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• preparing exposure data positioning said reticle patterns on said substrate for exposure;
• making an inference pattern corresponding to a substrate pattern on the assumption that said substrate pattern is formed in accordance with said reticle and exposure data;
• executing a logic operation of said inference pattern and patterns corresponding to a substrate pattern formed in accordance with said reticle and exposure data to make differentiated patterns to express difference between said inference pattern and patterns corresponding to exposure patterns of said substrate pattern;
• and
• overlapping said differentiated patterns with said inference pattern to simulate said substrate pattern.

A method of simulating substrate patterns, comprising:

• preparing reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• preparing exposure data positioning said reticle patterns on said substrate for exposure;
• making an inference pattern corresponding to a substrate pattern on the assumption that said substrate pattern is formed in accordance with said reticle and exposure data;
• executing a logic operation of said inference pattern and patterns corresponding to a substrate pattern formed in accordance with said reticle and exposure data to make differentiated patterns to express difference between said inference pattern and patterns corresponding to exposure patterns of said substrate pattern;
• and
• executing logic operations of said differentiated patterns and said inference pattern to simulate said substrate pattern.

A method of simulating substrate patterns, comprising:

• preparing reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• preparing exposure data positioning said reticle patterns on said substrate for exposure;
• and
• executing OR logic operations of patterns corresponding to exposure patterns formed on said substrate in accordance with said reticle and exposure data to simulate patterns of regions exposed on said substrate more than once.

A pattern simulation program, comprising:

• reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• exposure data positioning said reticle patterns on said substrate for exposure;
• and
• an instruction of AND logic operations of patterns corresponding to neighboring regions exposed on said substrate through said reticle patterns to simulate patterns of regions exposed on said substrate more than once.

A simulation program, comprising:

• reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• exposure data positioning said reticle patterns on said substrate for exposure;
• a first instruction for making an inference pattern corresponding to a substrate pattern on the assumption that said substrate pattern is formed based on said reticle and exposure data;
• and
• a second instruction for executing a logic operation of said inference pattern and patterns corresponding to a substrate pattern formed in accordance with said reticle and exposure data.

A pattern simulation program, comprising:

• reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• exposure data positioning said reticle patterns on said substrate for exposure;
• a first instruction for making an inference pattern corresponding to a substrate pattern on the assumption that said substrate pattern is formed in accordance with said reticle and exposure data;
• a second instruction for executing a logic operation of said inference pattern and patterns corresponding to a substrate pattern formed in accordance with said reticle and exposure data to make differentiated patterns to express difference between said inference pattern and patterns corresponding to exposure patterns of said substrate pattern;
• and
• a third instruction for overlapping said differentiated patterns with said inference pattern to simulate said substrate pattern.

A simulation program, comprising:

• reticle data of reticle patterns for a plurality of divided regions of an entire pattern formed on a substrate;
• exposure data positioning said reticle patterns on said substrate for exposure;
• a first instruction for making an inference pattern corresponding to a substrate pattern on the assumption that said substrate pattern is formed in accordance with said reticle and exposure data;
• a second instruction for executing a logic operation of said inference pattern and patterns corresponding to a substrate pattern formed in accordance with said reticle and exposure data to make differentiated patterns to express difference between said inference pattern and patterns corresponding to exposure patterns of said substrate pattern;
• and
• a third instruction for executing logic operations of said differentiated patterns and said inference pattern to simulate said substrate pattern.