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US 7,073,161 B2Granted
Methods of forming patterned reticles
AssigneeMicron Technology, Inc.
InventorsH. Daniel Dulman, William A. Stanton, John R. C. Futrell
Life of this patent
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Abstract
The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
Claims8
A method of forming a patterned reticle, comprising:
- providing a design which is ultimately to be printed in radiation-sensitive material utilizing the patterned reticle;
- utilizing a first set of design rules to develop a first approximation of a pattern layout of the patterned reticle for producing the design, the first approximation comprising a first set of layout elements;
- performing an optical proximity correction on the first approximation to form a second approximation of the pattern layout;
- after the optical proximity correction, adding additional layout elements to the second approximation to form a pattern layout dataset;
- the second approximation having principal layout elements with one or more planes of symmetry therethrough and the additional layout elements being added proximate one or more of the principal layout elements and asymmetrically relative to at least one of the planes of symmetry of the principal layout elements;
- and
- utilizing the pattern layout dataset during taping of a reticle to form the patterned reticle.
4 more elements
Dependencies are inferred from the claim text.