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US 7,072,438 B2Granted
Reflection type mask
AssigneeCanon Kabushiki Kaisha
InventorsKeiko Chiba, Masami Tsukamoto, Yutaka Watanabe, Shinichi Hara, Hiroshi Maehara
Life of this patent
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Abstract
A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
Claims9
A reflection type mask comprising:
- a mask body including (a) a substrate, (b) a multi-layered film which is formed on said substrate, for reflecting X-rays, (c) a pattern which is formed on said multi-layered film for absorbing the X-rays;
- and
- a cover for protecting said pattern,
- wherein said cover includes a vent hole having a lid openably closeable to said vent hole, and at least a part of said cover being arranged so as to be detachably attachable to said mask body.
1 more element
An X-ray mask comprising:
- a mask body including a pattern for absorbing X-rays;
- and
- a cover for protecting the pattern, which includes a vent hole,
- wherein the cover encloses a surface of the mask body, on which the pattern is provided, and another surface opposite to the surface of said mask body, and is arranged so as to be detachably attachable to said mask body.
1 more element
Dependencies are inferred from the claim text.