Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• an illuminator for conditioning a beam of radiation;
• a first support for supporting a patterning device, the patterning device serving to pattern the beam of radiation according to a desired pattern;
• a second support for supporting a substrate;
• a projection system for projecting the patterned beam onto a target portion of the substrate, the projection system comprising a lower surface for defining a working distance to said substrate;
• and
• at least one gas generator for generating a conditioned gas flow, said gas generator comprising
• a first guiding element for guiding said gas flow to a lower volume generally located below the lower surface of said projection system and to a volume between said lower surface and said substrate, wherein said first guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to said lower surface of the projection system;
• and
• a second guiding element that is arranged in the gas flow to locally deflect and split the gas flow so that the gas flow is partially directed to said volume between said lower surface and said substrate, and partially directed to said lower volume.