Method and apparatus for fabricating a conformal thin film on a substrate
AssigneeVeeco Instruments Inc.
InventorsJacques C. S. Kools, Randhir Bubber, Ming Mao, Thomas Andrew Schneider, Jinsong Wang
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Abstract
A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser plate adjacent to the expansion volume and a reaction chamber. The diffuser plate includes a protrusion located opposite the gas inlet and the protrusion reduces turbulence in the expansion volume.
Claims40
A method of fabricating a conformal film on a substrate, comprising:
- introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system, the ALD system further including a reaction chamber;
- and
- flowing the gas through a diffuser plate adjacent to the expansion volume and the reaction chamber, the diffuser plate including a protrusion located opposite the gas inlet, the protrusion operable to reduce turbulence in the expansion volume.
An apparatus for fabricating a conformal thin film on a substrate, comprising:
- a reaction chamber;
- and
- a gas injector adjacent to the reaction chamber, the gas injector including:
- an expansion volume;
- a gas inlet operable to introduce a gas into the expansion volume;
- a diffuser plate located adjacent the expansion volume and the reaction chamber;
- and
- a protrusion located adjacent to the diffuser plate and opposite the gas inlet, the protrusion operable to reduce turbulence in the expansion volume.
An apparatus for fabricating a conformal thin film on a substrate, comprising:
- a reaction chamber;
- and
- a gas injector adjacent to the reaction chamber, the gas injector including:
- an expansion volume;
- a gas inlet operable to introduce an inert gas into the expansion volume;
- and
- a diffuser plate located adjacent the expansion volume and the reaction chamber, the diffuser plate including a bevel located opposite the gas inlet, the bevel operable to reduce turbulence and gas phase reactions in the expansion volume.
Dependencies are inferred from the claim text.