Process for producing an image using a first minimum bottom antireflective coating composition

A process for forming an image on a substrate, comprising the steps of:

• (a) coating on the substrate a first layer of a radiation sensitive antireflective composition;
• (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition;
• (c) selectively exposing the coated substrate from step (b) to actinic radiation;
• and
• (d) developing the exposed coated substrate from step (c) in a single step with an aqueous alkali developing solution to form an image;
• wherein both the photoresist composition and the antireflective composition are exposed in step (c);
• both are developed in step (d) using a single developer;
• wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8 weight % solids, and a maximum coating thickness of the coated substrate of
• λ
• 2
• ⁢
• n
• wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition and a minimum coating thickness greater than zero.