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US 7,070,910 B2Granted
Silazane compound amd methods for using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsKyoung-Mi Kim, Yeu-Young Youn, Jae-Ho Kim, Young-Ho Kim, Shi-Yong Yi
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Abstract
An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.
Claims13
A (dichlorotetramethyl)disilazane compound having the chemical formula,
A method for forming a photoresist pattern comprising:
- forming an adhesive layer containing an adhesive compound having the following chemical formula on a substrate,
- forming a photoresist film on the adhesive layer;
- baking the photoresist film formed on the substrate;
- exposing the photoresist film to a light;
- and
- developing the photoresist film to form a photoresist pattern on the substrate.
3 more elements
Dependencies are inferred from the claim text.