Optical proximity correction method using weighted priorities
AssigneeLSI Logic Corporation
InventorsOlga A. Kobozeva, Mario Garza, Ramnath Venkatraman
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AssigneeLSI Logic Corporation
InventorsOlga A. Kobozeva, Mario Garza, Ramnath Venkatraman
Estimating the term…
A method of silicon design reproducibility enhancement using priority assignments prior to performing a conventional optical proximity correction process on a device. The present invention seeks to improve the manufacturability of VLSI devices. The present invention inserts a priority assignment step prior to the conventional OPC correction process in order to assert better control over transistor parameters. The priority assignment step sorts the layout by degree of importance to the cell/device performance. Areas designated as critical are given higher priority values while areas designated as non-critical are given lower priority values. The present invention imposes more precise accuracy requirements to high priority value areas and less precise accuracy requirements to low priority value areas. As a result, the present invention imposes the tightest accuracy requirements to critical areas of device performance, rather than attempting to achieve overall accuracy during the OPC correction process.
A method of enhancing the effectiveness of optical proximity correction on a device, the method comprising:
A method of enhancing the effectiveness of optical proximity correction on a device, the method comprising:
A method of improving symmetry between functional groups of a semiconductor device which undergo optical proximity correction, the method comprising:
A data processing system for enhancing the effectiveness of optical proximity correction, comprising:
A computer program product in a computer readable medium for enhancing the effectiveness of optical proximity correction, comprising:
Dependencies are inferred from the claim text.