US 7,068,926 B2 · Heat treatment apparatus of light-emission type and method of cleaning same

Abstract

After the maintenance of a heat treatment apparatus, a susceptor and a heating plate are moved upwardly and a nitrogen gas flow from an inlet toward an outlet passage is produced prior to heat treating a semiconductor wafer. In this state, flash lamps are turned on to cause momentary expansion and contraction of the gas in a chamber, thereby scattering particles deposited on a bottom plate, etc. The scattered particles are removed by the nitrogen gas passing through a bottom portion of the chamber and discharged through the outlet passage. The particles are easily removed due to the flash lamps being turned on a predetermined number of times at fixed time intervals while folowing the nitrogen gas. The heat treatment apparatus has a light-emission characteristic and easily removes the particles in the chamber.

Claims12

Dependent claims

A heat treatment apparatus for exposing a substrate to a flash of light to heat the substrate, comprising:

a process chamber for receiving a substrate therein;
a flash lamp for emitting a flash of light toward the interior of said process chamber to scatter particles in a treatment space within said process chamber;
an exhaust element for exhausting gas from said treatment space;
and
a control element for controlling said flash lamp to emit a flash of light toward the interior of said process chamber, with an objective substrate prohibited from being transported into said process chamber.

2 more elements

Dependencies are inferred from the claim text.

Heat treatment apparatus of light-emission type and method of cleaning same

Life of this patent

Heat treatment apparatus of light-emission type and method of cleaning same

Life of this patent

Abstract

Claims12