Method for forming pattern of one-dimensional nanostructure
AssigneeSamsung Electronics Co., Ltd.
InventorsJin Young Kim, Chang Ho Noh, Euk Che Hwang
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Abstract
Disclosed herein are a method for forming a pattern of a one-dimensional nanostructure, and a pattern of a one-dimensional nanostructure formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth, (ii) growing metal crystals by plating the latent pattern to form a metal pattern, and (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.
Claims15
A method for forming a pattern of a one-dimensional nanostructure, comprising the steps of:
- (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth;
- (ii) growing metal crystals by plating the latent pattern to form a metal pattern;
- and
- (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.
The method according to 1, wherein the fabrication and growth of the one-dimensional nanostructure in step (iii) are carried out by chemical vapor deposition, wherein the chemical vapor deposition is electron cyclotron resonance CVD (ECR-CVD) or plasma enhanced CVD (PE-CVD).
Dependencies are inferred from the claim text.