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US 7,067,234 B2Granted
Chemical consolidation of photoresists in the UV range
AssigneeInfineon Technologies AG
InventorJörg Rottstegge
Life of this patent
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Abstract
Structured resists are consolidated, that is post-exposure amplified. The amplifying agent used is a compound which contains at least one bicyclic or polycyclic group. The amplifying agent is attached via a reactive group to a reactive anchor group of a polymer that is used for the resist. The process is particularly suitable for amplifying copolymers of cycloolefins and maleic anhydride.
Claims9
A method of consolidating structured resists, which comprises:
- providing a substrate with a photoresist comprising at least one polymer containing anchor groups for attachment of an amplifying agent;
- sectionally exposing and developing the resist to form a structured resist;
- applying a silicon-free amplifying agent producing an increase in the etch resistance of the resist to the structured resist,
- the amplifying agent containing at least one bicyclic or polycyclic non-aromatic group and at least one reactive group capable of coordinating to the anchor groups of the polymer;
- and
- removing excess amplifying agent.
3 more elements
Dependencies are inferred from the claim text.