Precursors for silica or metal silicate films
AssigneeAir Products and Chemicals, Inc.
InventorsXinjian Lei, Ron Rulkens
Life of this patent
Estimating the term…
Abstract
A composition selected from the group consisting of bis(tert-butoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof; its use to form a metal or metalloid silicate layer on a substrate and the synthesis of the mixed alkoxysilanols.
Claims14
A composition selected from the group consisting of bis(tert-butoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof.
Bis(tert-butoxy)(iso-propoxy)silanol.
A method for forming a metal or metalloid silicate on a substrate, comprising contacting a metal or metalloid containing compound with a mixed alkoxysilanol selected from the group consisting of bis(tert-butoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof and reacting the metal or metalloid containing compound with the mixed alkoxysilanol to form the metal or metalloid silicate on the substrate.
A method for forming a metal or metalloid silicate on a substrate, comprising contacting a metal or metalloid containing compound with bis(tert-butoxy)(iso-propoxy)silanol and reacting the metal or metalloid containing compound with the bis(tert-butoxy)(iso-propoxy)silanol to form the metal or metalloid silicate on the substrate.
Dependencies are inferred from the claim text.