Method of removing polymer and apparatus for doing the same
AssigneeNEC Electronics Corporation
InventorsHiroyuki Sonoda, Hidehiko Kawaguchi, Morimitsu Tanaka, Hiroki Ohno
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Abstract
A method of removing polymer adhered to a sidewall of an etched metal layer formed on a substrate, includes (a) dissolving the polymer by providing chemicals onto a surface of the substrate, and (b) rinsing the chemicals out of the substrate by providing pure water onto a surface of the substrate, wherein at least a part of the step (a) is carried out in oxidation atmosphere.
Claims27
A method of removing polymer adhered to a sidewall of an etched metal layer formed on a substrate, comprising:
- (a) dissolving said polymer by providing chemicals onto a surface of said substrate;
- and
- (b) rinsing said chemicals out of said substrate by providing pure water onto a surface of said substrate,
- wherein at least a part of said step (a) is carried out in an oxidation atmosphere that is created by supplying pure oxygen to said substrate.
A method of removing polymer adhered to a sidewall of an etched metal layer formed on a substrate, comprising:
- placing the substrate in a closed space;
- then dissolving said polymer by providing chemicals onto a surface of said substrate;
- and
- then rinsing said chemicals out of said substrate by providing pure water onto a surface of said substrate,
- wherein at least a part of said dissolving said polymer step is carried out while supplying oxygen to the closed space.
A method of removing polymer adhered to a sidewall of an etched metal layer formed on a substrate, comprising:
- placing the substrate in a closed space;
- then supplying an inert gas to said closed space;
- then dissolving said polymer by providing chemicals onto a surface of said substrate;
- and
- then rinsing said chemicals out of said substrate by providing pure water onto a surface of said substrate,
- wherein at least a part of said dissolving said polymer step is carried out while supplying pure oxygen to the closed space.
Dependencies are inferred from the claim text.