Phase measurement apparatus for measuring characterization of optical thin films
AssigneeCanon Kabushiki Kaisha
InventorsSeiji Takeuchi, Akiyoshi Suzuki, Minoru Yoshii
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Abstract
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.
Claims3
A phase measuring apparatus for measuring, based on interference information, phase information dependent upon an angle incident on a film applied onto an object to be measured, said phase measuring apparatus comprising:
- a condenser for condensing light from a light source;
- a grating for diffracting light from said condenser into diffracted beams of multiple orders and for introducing to the object, the beams that is convergent;
- a reflector, provided at a condensing point of light reflected on the object, for reflecting two diffracted beams of a specific order;
- and
- a detector for detecting the interference information based on the two diffracted beams reflected on said reflector.
A phase measuring apparatus for measuring, based on interference information, phase information dependent upon an angle incident on a film applied onto an object to be measured, said phase measuring apparatus comprising:
- a condenser for condensing light from a light source;
- an aperture close to a condensing point of the light;
- a grating for introducing to the object, the light that has passed said aperture and is divergent light;
- and
- a detector for detecting the interference information based on two beams having offset wavefronts, the two beams resulting from the light that has been reflected on the object and diffracted by said grating.
Dependencies are inferred from the claim text.