Exposure apparatus and purging method for the same
AssigneeCanon Kabushiki Kaisha
InventorSumitada Yamamoto
Life of this patent
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Abstract
Disclosed is an exposure apparatus including an exposure light source, an optical system, a casing, a gas replacing system, and a control system. The optical system directs exposure light from the exposure light source to a photosensitive substrate. The casing accommodates therein at least one optical element of the optical system. The gas replacing system supplies a purge gas into the casing to replace a gas inside the casing with the purge gas. The control system controls the gas replacing system so as to increase a flow rate of the purge gas if a predetermined time elapses after an exposure is completed and before a next exposure starts.
Claims8
An exposure apparatus for projecting a pattern of a mask onto a substrate, said apparatus comprising:
- an exposure light source;
- an optical system which directs exposure light from said exposure light source to the substrate through the mask;
- a casing which accommodates at least one optical element of said optical system;
- a gas replacing system which supplies a purge gas into said casing to replace a gas inside said casing with the purge gas;
- a first control system which controls said gas replacing system so as to decrease a flow rate of the purge gas in accordance with reception of a signal for instructing an exposure start;
- and
- a second control system which sends the signal to said first control system and starts an exposure operation after a standby time since sending the signal.
An exposure method applied to an exposure apparatus for projecting a pattern of a mask onto a substrate, the apparatus including an exposure light source, an optical system which directs exposure light from the exposure light source to the substrate through the mask, a casing which accommodates at least one optical element of the optical system, and a gas replacing system which supplies a purge gas into the casing to replace a gas inside the casing with the purge gas, said method comprising steps of:
- decreasing a flow rate of the purge gas supplied by the gas replacing system in accordance with an instruction of an exposure start;
- and
- projecting the pattern onto the substrate, after a standby time since the instruction, with the exposure light which passes through the at least one optical element accommodated in the casing in which the flow rate has been decreased in said decreasing step.
A method of manufacturing a device, said method comprising steps of:
- projecting a pattern of a mask onto a substrate using an exposure apparatus, said exposure apparatus comprising:
- an exposure light source:
- an optical system which directs exposure light from said exposure light source to the substrate through the mask;
- a casing which accommodates at least one optical element of said optical system;
- a gas replacing system which supplies a purge gas into said casing to replace a gas inside said casing with the purge gas;
- a first control system which controls said gas replacing system so as to decrease a flow rate of the purge gas in accordance with reception of a signal for instructing an exposure start;
- and
- a second control system which sends the signal to said first control system and starts an exposure operation after a standby time since sending the signal;
- developing the substrate onto which the pattern has been projected;
- and processing the developed substrate to produce the device.
Dependencies are inferred from the claim text.