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US 7,029,805 B2Granted
Imageable element with masking layer comprising betaine-containing co-polymers
AssigneeEastman Kodak Company
InventorsKevin Ray, Ting Tao, Scott Beckley
Life of this patent
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Abstract
Thermally imageable elements comprising a masking layer and a substrate are disclosed. The masking layer contains a sulfobetaine and/or a carboxybetaine containing co-polymer or a mixture of a sulfobetaine and/or a carboxybetaine containing co-polymers and absorbs both infrared and ultraviolet radiation. When the masking layer is on the substrate, the imageable element may be imaged and developed to form a photomask. When the imageable element additionally comprises a photosensitive layer, the masking layer may be imaged and developed to form an integral photomask. The imageable elements that comprise a photosensitive layer are useful as flexographic printing plate precursors.
Claims32
An imageable element comprising, in order:
- (a) a substrate, and
- (b) a masking layer comprising a radiation absorber and one or more co-polymers selected from the group consisting of co-polymers that comprises sulfobetaine containing side chains, co-polymers that comprise carboxybetaine containing side chains, and co-polymers that comprise sulfobetaine containing side chains and carboxybetaine containing side chains;
- wherein:
- the radiation absorber comprises one or more materials selected from the group consisting of materials that absorb ultraviolet radiation, photothermal conversion materials, photothermal conversion materials that also absorb ultraviolet radiation, and mixtures thereof;
- and
- the masking layer absorbs ultraviolet radiation and infrared radiation.
3 more elements
A method for forming an image, the method comprising the steps of:
- (A) providing an imageable element, the imageable element comprising, in order:
- (i) a flexible substrate,
- (ii) a photosensitive layer, and
- (iii) a masking layer comprising a radiation absorber and one or more co-polymers selected from the group consisting of co-polymers that comprises sulfobetaine containing side chains, co-polymers that comprise carboxybetaine containing side chains, and co-polymers that comprise sulfobetaine containing side chains and carboxybetaine containing side chains;
- in which:
- the radiation absorber comprises one or more materials selected from the group consisting of materials that absorb ultraviolet radiation, photothermal conversion materials, photothermal conversion materials that also absorb ultraviolet radiation, and mixtures thereof;
- and
- the masking layer absorbs ultraviolet radiation and infrared radiation;
- (B) thermally imaging the masking layer and forming an imaged masking layer comprising imaged regions and complementary unimaged regions in the imageable layer;
- (C) forming a photomask by developing the imaged masking layer and removing the unimaged regions;
- (D) overall exposing the imageable element with ultraviolet radiation through the photomask and forming an imaged imageable element comprising imaged and complementary unimaged regions in the photosensitive layer;
- (E) removing the photomask;
- and
- (F) developing the imaged imageable element and forming the image by removing one of the imaged regions and the unimaged regions;
- in which steps (E) and (F) can be carried out at the same time.
12 more elements
A method for forming an image, the method comprising the steps of:
- (A) providing a first imageable element, the first imageable element comprising, in order:
- a first substrate, and
- a masking layer comprising a radiation absorber and one or more co-polymers selected from the group consisting of co-polymers that comprises sulfobetaine containing side chains, co-polymers that comprise carboxybetaine containing side chains, and co-polymers that comprise sulfobetaine containing side chains and carboxybetaine containing side chains on the first substrate;
- in which:
- the radiation absorber comprises one or more materials selected from the group consisting of materials that absorb ultraviolet radiation, photothermal conversion materials, photothermal conversion materials that also absorb ultraviolet radiation, and mixtures thereof;
- the first substrate transmits ultraviolet radiation;
- and the masking layer absorbs ultraviolet radiation and infrared radiation,
- (B) thermally imaging the masking layer and forming an imaged masking layer comprising imaged regions and complementary unimaged regions;
- (C) forming a photomask by developing the imaged masking layer and removing the unimaged regions;
- (D) providing a second imageable element, the second imageable element comprising, in order:
- a second substrate;
- and
- a photosensitive layer over the second substrate;
- (E) overall exposing the photosensitive layer with ultraviolet radiation through the photomask and forming an imaged second imageable element in which the photosensitive layer comprises imaged and complementary unimaged regions;
- (F) removing the photomask;
- and
- (G) developing the imaged second imageable element and forming the image by removing one of the imaged regions and the unimaged regions.
14 more elements
Dependencies are inferred from the claim text.