Substrate heater assembly

An apparatus for processing a substrate of a predetermined standardized diameter, comprising:

• a chemical vapor deposition chamber having a ceramic substrate heater assembly disposed therein, wherein the heater assembly comprises:
• a body having an uppersurface and a lower surface;
• a heating element embedded within the body;
• a substrate support surface formed in the upper surface of the body and defining portion of a substrate receiving pocket;
• and
• an annular wall oriented perpendicular to the upper surface and having a length of at least one half a thickness of the substrate, the wall bounding an outer perimeter of the substrate receiving pocket and having a diameter less than about 0.5 mm greater than the predetermined substrate diameter.

An apparatus for processing a substrate of a predetermined standardized diameter, comprising:

• a chemical vapor deposition chamber having a ceramic substrate heater assembly disposed therein, wherein the heater assembly comprises:
• a body having an upper surface and a lower surface;
• a heating element embedded within the body;
• a substrate support surface formed in the upper surface of the body and defining a portion of a substrate receiving pocket;
• an annular wall coupled between the substrate support surface and the upper surface, the wall having a length of at least one half a thickness of the substrate and a diameter less than about 0.5 mm greater than the predetermined substrate diameter;
• and
• a continuous lip protruding from the upper surface and circumscribing the wall, the continuous lip having an inner portion joined with the bevel.