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US 7,022,948 B2Granted
Chamber for uniform substrate heating
AssigneeApplied Materials, Inc.
InventorsQuanyuan Shang, Janine Kardokus, Akihiro Hosokawa
Life of this patent
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Abstract
Embodiments of the invention generally provide an apparatus and a method for providing a uniform thermal profile to a plurality of substrates during heat processing. In one embodiment, a cassette containing one or more heated substrate supports is moveably disposed within a heating chamber having an about uniform thermal profile therein to more uniformly heat the substrates.
Claims11
A method for processing substrates, comprising:
- supporting a plurality of substrates on a plurality of substrate supports movably disposed within a chamber, the chamber having a heat reflector disposed within the chamber, and a heater adjacent to the heat reflector and coupled to the body of the chamber;
- providing a vacuum within the chamber;
- and
- heating the plurality of substrates disposed on the plurality of substrate supports comprising:
- heating the heater outside the plurality of the substrate support;
- and
- heating a plurality of heating elements disposed in the plurality of the substrate supports using a heat pattern which matches a heat loss profile for the plurality of the substrates within the chamber.
4 more elements
A method for processing substrates, comprising:
- supporting a plurality of substrates on a plurality of substrate supports movably disposed within a chamber, the chamber having a heat reflector disposed within the chamber, and a heater adjacent to the heat reflector and coupled to the body of the chamber;
- providing a vacuum within the chamber;
- and
- heating the plurality of substrates within the chamber by heating a plurality of heating elements disposed in the substrate supports using a heat pattern machine a heat loss profile of the substrate and providing more concentrated heat to corners and edges of the substrates.
1 more element
A method for heating substrates, comprising:
- supporting a plurality of substrates on a plurality of substrate supports movably disposed within a chamber, the chamber having a heat reflector disposed within the chamber, and a heater adjacent to the heat reflector and coupled to the body of the chamber;
- providing a vacuum within the chamber;
- and
- maintaining the temperature of the substrates at a range of between about 350° C. and about 600° C., wherein the temperature of the substrates is maintained by heating the heater and the substrate supports to provide a substrate temperature profile within the chamber having a normalized temperature variation of about +/−10° C.
1 more element
Dependencies are inferred from the claim text.