Mask and its manufacturing method, and method for manufacturing semiconductor device
AssigneeSony Corporation
InventorMasaki Yoshizawa
Life of this patent
Estimating the term…
Abstract
To provide a mask able to reduce the thickness of a membrane and maintain the mask strength and a method of producing a semiconductor device able to form a fine pattern with a high accuracy and a method of producing the mask. A mask comprising a thin film, holes formed at the thin film through which a charged particle beam (preferably an electron beam) passes, a support layer formed at one side of the thin film, and apertures formed at a larger size than the holes at least at portions of said holes of said support layer and a method of producing the same and a method of producing a semiconductor device including a lithography step using the same.
Claims25
A mask comprising:
- a membrane, at least one hole extending through said membrane;
- a support layer, at least one aperture extending though said support layer, said at least one aperture being self-aligned with said at least one hole, said at least one aperture being larger than said at least one hole;
- an assist layer, said support layer being between said membrane and said assist layer, said at least one aperture terminating at said assist layer;
- and
- a frame, said assist layer being between said support layer and said frame, an opening extending through said frame to said support layer, said opening being in alignment with said at least one hole, said opening being larger than said at least one aperture.
A mask comprising:
- a membrane, at least one hole extending through said membrane;
- a support layer, at least one aperture extending though said support layer, said at least one aperture being self-aligned with said at least one hole, said at least one aperture being larger than said at least one hole;
- an etching stopper layer, said support layer being between said membrane and said etching stopper layer, said at least one aperture terminating at said etching stopper layer;
- and
- a frame, said membrane being between said support layer and said frame, an opening extending through said frame to said membrane, said opening being in alignment with said at least one hole, said opening being larger than said at least one aperture.
Dependencies are inferred from the claim text.