Semiconductor integrated circuit device and a method of manufacturing the same

A method of manufacturing a semiconductor integrated circuit device, comprising steps of:

• forming a first groove, a second groove and a third groove in an interlayer insulating film;
• burying a conductive film in said first and said second groove to form a first conductive pattern in said first groove, a second conductive pattern in said second groove and a third conductive pattern in said third groove,
• wherein a first n channel MISFET, a second n channel MISFET, a first p channel MISFET and a second p channel MISFET are formed on a semiconductor substrate and constitute a memory cell,
• wherein said interlayer insulating film is formed to cover said first n channel MISFET, said second n channel MISFET, said first p channel MISFET, said second p channel MISFET and a capacitor element forming region,
• wherein said first conductive pattern is electrically connected to a drain region of said first n channel MISFET, a drain region of said first p channel MISFET, a gate electrode of said second n channel MISFET and a gate electrode of said second p channel MISFET,
• wherein said second conductive pattern is electrically connected to a drain region of said second n channel IVIISFET, a drain region of said second p channel MISFET, a gate electrode of said first n channel MISFET and a gate electrode of said first p channel MISFET,
• wherein said third conductive pattern is serving as an electrode of a first capacitor element;
• forming a insulating film over said first and said second conductive pattern;
• forming an opening over said first conductive pattern;
• forming a fourth conductive pattern and a fifth conductive pattern such that said fourth conductive pattern is formed over said first conductive pattern so as to electrically connect to said first conductive pattern through said opening and such that that said third conductive pattern extends over said second conductive pattern,
• wherein said fifth conductive pattern extends over said third conductive pattern through said insulating film and serves as an another electrode of said first capacitor element,
• wherein a second capacitor element is comprised of said third conductive pattern, said second conductive pattern and said insulating film.

A method of manufacturing a semiconductor integrated circuit device, comprising steps of:

• forming a first interlayer insulating film having a first groove, and a second groove in said first interlayer insulating film;
• burying a conductive film in said first and said second groove to form a first conductive pattern in said first groove and a second conductive pattern in said second groove;
• forming a second interlayer insulating film having a third groove, a fourth groove and a fifth groove in said second interlayer insulating film;
• burying a conductive film in said third and said fourth groove to form a third conductive pattern in said third groove, a fourth conductive pattern in said fourth groove and, a fifth conductive pattern in said fifth groove;
• wherein a first MISFET of a first channel type, a second MISFET of said first channel type, a first MISFET of a second channel type and a second MISFET of said second channel type are formed on a semiconductor substrate and constitute a memory cell,
• wherein said first and said second interlayer insulating film is formed to cover said first MISFET of said first channel type, said second MISFET of said first channel type, said first MISFET of said second channel type, said second MISFET of said second channel type and a first capacitor element forming region,
• wherein said first conductive pattern is electrically connected to a drain region of said first MISFET of said second channel type and a gate electrode of said second MISFET of said second channel type,
• wherein said second conductive pattern is electrically connected to a drain region of said second MISFET of said second channel type and a gate electrode of said first MISFET of said second channel type,
• wherein said third conductive pattern is electrically connected to a drain region of said first MISFET of said first channel type, a gate electrode of said second MISFET of said first channel type and said first conductive pattern,
• wherein said fourth conductive pattern is electrically connected to a drain region of said second MISFET of said first channel type, a gate electrode of said first MISFET of said first channel type and said second conductive pattern,
• wherein said third conductive pattern is serving as an electrode of a first capacitor element;
• forming a insulating film over said third, said fourth conductive pattern and a fifth conductive pattern;
• forming an opening over said third conductive pattern;
• forming a sixth conductive pattern and a seventh conductive pattern such that said sixth conductive pattern is formed over said third conductive pattern so as to electrically connect to said third conductive pattern through said opening and such that that said sixth conductive pattern extends over said fourth conductive pattern,
• wherein said seventh conductive pattern extends over said fifth conductive pattern through said insulating film and serves as an another electrode of said first capacitor element,
• wherein a second capacitor element is comprised of said sixth conductive pattern, said fourth conductive pattern and said insulating film.

A method of manufacturing a semiconductor integrated circuit device, comprising steps of:

• forming a first interlayer insulating film having a first contact hole a second contact hole, a third contact hole, a fourth contact hole and a fifth contact hole in said first interlayer insulating film;
• burying a conductive film in said first, said second, said third, said fourth and said fifth contact hole to form a first conductive pattern in said first contact hole, a second conductive pattern in said second contact hole, a third conductive pattern in said third contact hole, a fourth conductive pattern in said fourth contact hole and a fifth conductive pattern in said fifth contact hole;
• forming a second interlayer insulating film having a first wiring trench, a second wiring trench and a third wiring trench in said second interlayer insulating film;
• burying a conductive film in said first, said second and said third wiring trench to form a first trench wiring pattern in said first wiring trench, a second trench wiring pattern in said second wiring trench and a third trench wiring pattern in said third wiring trench;
• wherein a first MISFET of a first channel type, a second MISFET of said first channel type, a first MISFET of a second channel type and a second MISFET of said second channel type are formed on a memory cell forming region of a semiconductor substrate and constitute a memory cell, wherein a fifth MISFET is formed on a logic circuit forming region of said substrate,
• wherein said first and said second interlayer insulating film is formed to cover said first MISFET of said first channel type, said second MISFET of said first channel type, said first MISFET of said second channel type, said second MISFET of said second channel type and said fifth MISFET,
• wherein said first conductive pattern is electrically connected to a drain region of said first MISFET of said first channel type,
• wherein said second conductive pattern is electrically connected to a drain region of said first MISFET of said second channel type,
• wherein said third conductive pattern is electrically connected to a drain region of said second MISFET of said first channel type,
• wherein said fourth conductive pattern is electrically connected to a drain region of said second MISFET of said second channel type,
• wherein said fifth conductive pattern is electrically connected to one of a drain region and a source region of said fifth MISFET,
• wherein said first trench wiring pattern is electrically connected to said first conductive pattern, said second conductive pattern, a gate electrode of said second MISFET of said first channel type and a gate electrode of said second MISFET of said second channel type,
• wherein said second trench wiring pattern is electrically connected to said third conductive pattern, said fourth conductive pattern, a gate electrode of said first MISFET of said first channel type and a gate electrode of said first MISFET of said second channel type;
• wherein said third trench wiring pattern is electrically connected to said third conductive pattern,
• forming an insulating film over said first, said second and said third trench wiring pattern;
• forming an opening over said first trench wiring pattern;
• forming a fifth conductive pattern such that said fifth conductive pattern is formed over said first trench wiring pattern so as to electrically connect to said first trench wiring pattern through said opening and such that that said fifth conductive pattern extends over said second trench wiring pattern,
• wherein a capacitor element is comprised of said fifth conductive pattern, said second trench wiring pattern and said insulating film.

A method of manufacturing a semiconductor integrated circuit device, comprising steps of:

• forming a first groove, a second groove and a third groove in an interlayer insulating film;
• burying a conductive film in said first, said second and said third groove to form a first conductive pattern in said first groove, a second conductive pattern in said second groove and a third conductive pattern in said third groove,
• wherein a first MISFET and a second MISFET constitute a memory cell,
• wherein said interlayer insulating film is formed to cover said first MISFET, said second MISFET and a capacitor element forming region,
• wherein said first conductive pattern is electrically connected to a drain region of said first MISFET and a gate electrode of said second MISFET,
• wherein said second conductive pattern is electrically connected to a drain region of said second MISFET and a gate electrode of said MISFET, wherein said third conductive pattern is serving as an electrode of a first capacitor element;
• forming an insulating film over said third conductive pattern;
• forming a fourth conductive pattern over said third conductive pattern through said insulating film,
• wherein said fourth conductive pattern serves as an another electrode of said first capacitor element.