Photosensitive composition
AssigneeFuji Photo Film Co., Ltd.
InventorKunihiko Kodama
Life of this patent
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Abstract
A photosensitive composition comprising a compound that generates an acid upon irradiation of an actinic ray or radiation (Component A), a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution (Component B), a performance adjusting agent (Component C) and a solvent (Component D), wherein a, b, c and d, which represents contents of Component A, Component B, Component C and Component D in terms of part by weight respectively, satisfy formulae (1) and (2) shown below, provided that c may be 0 (a+b+c)/(a+b+c+d)=0.03 to 0.10 (1) [(Number of aromatic ring included in molecule of Component A+1)×a]/(a+b+c)=0.05 to 0.80. (2)
Claims14
A photosensitive composition comprising a compound that generates an acid upon irradiation of an actinic ray or radiation (Component A), a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution (Component B), a performance adjusting agent (Component C) and a solvent (Component D), wherein a, b, c and d, which represents contents of Component A, Component B, Component C and Component D in terms of part by weight respectively, satisfy formulae (1) and (3) shown below, provided that c may be 0:
- (a+b+c)/(a+b+c+d)=0.03 to 0.10 (1)
- a/(a+b+c)=0.05 to 0.15 (3).
Dependencies are inferred from the claim text.